J Mater Sci Technol ›› 2003, Vol. 19 ›› Issue (04): 299-302.

• Research Articles • Previous Articles     Next Articles

Preparation of Scratch-Resistant Nano-Porous Silica Films Derived by Sol-Gel Process and Their Anti-reflective Properties

Guangming WU, Jun SHEN, Tianhe YANG, Bin ZHOU, Jue WANG   

  1. Pohl Institute of Solid State Physics, Tongji University, Shanghai 200092, China
  • Received:1900-01-01 Revised:1900-01-01 Online:2003-07-28 Published:2009-10-10
  • Contact: Guangming WU

Abstract: Structural strengthening of the nano porous silica films has been reported. The films were prepared with a base/acid two-step catalyzed TEOS-based sol-gel processing and dip-coating, and then baked in the mixed gas of ammonia and water vapor. The silica films were characterized with TEM, AFM, FTIR, spectrophotometer, ellipsometer, and abrasion test, respectively. The experimental results have shown that the films have a nanostructure with a low refractive index and can form an excellent scratch-resistant broadband anti-reflectance. The two-step catalysis noticeably strengthens the films, and the mixed gas treatment further improves mechanical strength of the silica network. Finally the strengthening mechanism has been discussed.

Key words: Sol-gel process, Silica films, Anti-reflectance, Nano porous structure