J Mater Sci Technol ›› 2002, Vol. 18 ›› Issue (02): 101-107.

• Research Articles • Previous Articles     Next Articles

Properties of TiO2 Thin Films Prepared by Magnetron Sputtering

Wenjie ZHANG, Ying LI, Fuhui WANG   

  1. State Key Laboratory for Corrosion and Protection, Institute of Metal Research, The Chinese Academy of Sciences, Shenyang 110016, China
  • Received:1900-01-01 Revised:1900-01-01 Online:2002-03-28 Published:2009-10-10
  • Contact: Fuhui WANG

Abstract: With rapid progressive application of TiO2 thin films, magnetron sputtering becomes a very interesting method to prepare such multi-functional thin films. This paper focuses on influences of various deposition processes and deposition rate on the structures and properties of TiO2 thin films. Anatase, rutile or amorphous TiO2 films with various crystalline structures and different photocatalytic, optical and electrical properties can be produced by varying sputtering gases, substrate temperature, annealing process, deposition rate and the characteristics of magnetron sputtering. This may in turn affect the functions of TiO2 films in many applications. Furthermore, TiO2-based composites films can overcome many limitations and improve the properties of TiO2 films.

Key words: TiO2 thin film, Magnetron sputtering, Deposition process, Composite film