J Mater Sci Technol ›› 2001, Vol. 17 ›› Issue (S1): 40-42.

• Research Articles • Previous Articles     Next Articles

Effect of annealing temperature on transformation behaviors of Ti-50.2 at. pct Ni thin film

Xiaopeng LIU, Mingzhou CAO, Wei JIN, Changgong MENG, Dazhi YANG   

  1. Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China...
  • Received:2000-10-08 Revised:2000-12-08 Online:2001-10-28 Published:2009-10-10
  • Contact: Xiaopeng LIU

Abstract: The effect of the annealing treatment on the transformation behaviors of the Ti-50.2 at. pct Ni thin films prepared,by d.c magnetron sputtering system was investigated, The results show that two different kinds of precipitates, both Ni3Ti and Ti4Ni2O, co-existed in the annealed thin films. The transformation temperatures of thin film increased with increasing annealing temperature from 500 to 650 degreesC, but they dropped at 750 degreesC. The complicated changes of the transformation temperatures were related to the existence of both Ni3Ti and Ti4Ni2O precipitates.

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