J. Mater. Sci. Technol. ›› 2021, Vol. 81: 117-122.DOI: 10.1016/j.jmst.2020.11.059

• Research Article • Previous Articles     Next Articles

Preparation of a tantalum-based MoSi2-Mo coating resistant to ultra-high-temperature thermal shock by a new two-step process

Sainan Liub, Hongtai Shena,c, Jiawei Xua, Xiaojun Zhoua, Jianfei Liua, Zhenyang Caia,c,*(), Xiaojun Zhaoa,c,*(), Lairong Xiaoa,c,*()   

  1. aSchool of Materials Science and Engineering, Central South University, Changsha, Hunan, 410083, China
    bCenter for Mineral Materials, School of Minerals Processing and Bioengineering, Central South University, Changsha, 410083, Hunan, China
    cKey Laboratory of Non-ferrous Metal Materials Science and Engineering, Ministry of Education, Central South University, Changsha, 410083, China
  • Received:2020-07-27 Revised:2020-11-08 Accepted:2020-11-30 Published:2021-01-07 Online:2021-01-07
  • Contact: Zhenyang Cai,Xiaojun Zhao,Lairong Xiao
  • About author:xiaolr@csu.edu.cn (L. Xiao).
    zhaoxj@csu.edu.cn (X. Zhao),
    *School of Materials Science and Engineering, CentralSouth University, Changsha, Hunan, 410083, China.E-mail addresses: csuczy@csu.edu.cn (Z. Cai),

Abstract:

To develop an ultra-high-temperature resistant coating for a reusable thermal protection system, the preparation of a tantalum-based MoSi2-Mo coating by a new two-step process of multi-arc ion plating and halide activated pack cementation is presented. The coating has a dense structure and is well compatible with the tantalum substrate, which can be thermally shocked from room temperature to 1750 °C for 360 cycles without failure. The mechanism of the coating’s excellent resistance to high-temperature thermal shocks is that a strong-binding gradient interface and a dense SiO2 oxide scale with good oxygen resistance are formed by the high-temperature self-diffusion of Si.

Key words: Thermal shock, MoSi2, Tantalum, Multi-arc ion plating, Pack cementation