J. Mater. Sci. Technol. ›› 2015, Vol. 31 ›› Issue (2): 205-209.DOI: 10.1016/j.jmst.2014.09.003

• Orginal Article • Previous Articles     Next Articles

Structural and Electronic Properties of BaO/MgO(001)-type Interface Studied via Aberration-corrected Transmission Electron Microscopy and First-principles Calculations

Lei Deng1, Shaobo Mi1, 2, 3, Dong Chen1, Yuanming Wang1, Xiuliang Ma1   

  1. 1 Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China; 2 International Center for Dielectric Research (ICDR), Xi'an Jiaotong University, Xi'an 710049, China; 3 Institute of Solid State Research and Ernst Ruska Centre for Microscopy and Spectroscopy with Electrons, Forschungszentrum Jülich, Jülich D-52425, Germany
  • Received:2014-04-11 Online:2015-02-20 Published:2015-07-23
  • Contact: Corresponding author. Prof., Ph.D.; Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China. Tel.: +86 24 23971843; Fax: +86 24 23891320.E-mail address: sbmi@imr.ac.cn (S. Mi).
  • Supported by:
    The work was supported by the Hundred Talents Project of Chinese Academy of Sciences, the National Basic Research Program of China (No. 2009CB623705) and the National Natural Science Foundation of China (Nos. 51471169 and 51390472).

Abstract: The properties of BaO/MgO-type interface in the BaZrO3/MgO(001) heterostructure are studied by aberration-corrected high-resolution transmission electron microscopy combined with first-principles calculations. Experimental evidence demonstrates that cation displacement and vacancies occur at the interface. Our first-principle calculations show that cation displacement results from the electrostatic potential effect at the interface, and cation vacancies could lower the interfacial work of separation and enhance the interfacial stability of BaO/MgO-type interface. The results highlight that the effect of interfacial defects should be taken into account in understanding the film growth kinetics and properties in oxide heteroepitaxy.

Key words: Thin films, Interface, Transmission electron microscopy, First-principles calculations