[1 ] I.C. Robin, R. Andre, C. Bougerol, T. Aichele and S. Tatarenkoa: Appl. Phys. Lett., 2006, 88, 233103.
[2 ] G.R. Liu and S.S. Quek Jerry: Semicond. Sci. Technol., 2002, 17, 630.
[3 ] T. Benabbas, Y. Androussi and A. Lefebvre: J. Appl. Phys., 1999, 86, 1945.
[4 ] G. Muralidharan: Jpn. J. Appl. Phys., 2000, 39, L658.
[5 ] B.L. Liang, Zh.M. Wang, Yu.I. Mazur and G.J. Salamo: Appl. Phys. Lett., 2006, 89, 043125.
[6 ] J. Terso®, C. Teichert and M.G. Lagally: Phys. Rev. Lett., 1996, 76, 10.
[7 ] Ronald E. Miller and Vijay B. Shenoy: Nanotechnology, 2000, 11, 139.
[8 ] V.A. Shchukin and D. Bimberg: Appl. Phys. A, 1998, 67, 687.
[9 ] S.M. Wise, J.S. Lowengrub, J.S. Kim, K. Thornton, P.W. Voorhees and W.C. Johnson: Appl. Phys. Lett., 2005, 87, 133102.
[10] M. DeSeta, G. Capellini and F. Evangelisti: Phys. Rev. B, 2005, 71, 115308.
[11] S. Kiravittaya, H. Heidemeyer and O. Schmidt: Appl. Phys. Lett., 2005, 86, 263113.
[12] S.S. Quek and G.R. Liu: Thin Solid Films, 2005, 479, 297.
[13] P. Liu, Y. W. Zhang and C. Lu: Appl. Phys. Lett., 2006, 88, 041922.
[14] V.A. Shchukin and D. Bimberg: Appl. Phys. A, 1998, 67, 687.
[15] B.H. Koo, T. Hanada, H. Makino and T. Yao: Phys. Lett., 2001, 79, 4331.
[16] H. She and B. Wang: Semicond. Sci. Technol., 2009, 24, 025002.
[17] H. She and B. Wang: Finite Elements in Analysis & Design, 2009. (In Press)