J. Mater. Sci. Technol. ›› 2007, Vol. 23 ›› Issue (04): 571-573.

• 论文 • 上一篇    下一篇

Composition and Microstructure of Magnetron Sputtering Deposited Ti-containing Amorphous Carbon Films

杜军;张平   

  1. 北京装甲兵工程学院再制造工程系；装备再制造技术国防科技重点实验室
  • 收稿日期:2006-11-29 修回日期:2007-06-29 出版日期:2007-07-28 发布日期:2009-10-10
  • 通讯作者: 杜军

Composition and Microstructure of Magnetron Sputtering Deposited Ti-containing Amorphous Carbon Films

Jun DU, Ping ZHANG   

  1. National Key Laboratory for Remanufacturing, Academy of Armored Force Engineering, Beijing 100072, China
  • Received:2006-11-29 Revised:2007-06-29 Online:2007-07-28 Published:2009-10-10
  • Contact: Jun DU

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摘要： 用磁控溅射方法制备了含Ti的非晶碳膜。XPS分析了碳键结构、化合物组成，碳膜的C1s峰都在284eV附近，碳膜中sp2较sp3占明显优势，说明碳键结构以sp2为主。含Ti碳膜的Ti2p谱有TiC所对应的峰，说明形成了TiC；XRD、TEM的分析结果证明碳膜的晶体结构为非晶，未添加金属元素的碳膜除基体的Si峰外，未发现其他相的存在，加入Ti后，出现了对应的碳化物TiC相。可以认定：磁控溅射制备的碳膜是碳键结构以sp2为主非晶碳膜，加入Ti后，在非晶的基体上形成Ti化合物的晶体颗粒。

关键词: 磁控溅射, 碳膜, 碳键结构

Abstract: Ti-containing carbon films were deposited by using magnetron sputtering deposition. The composition and microstructure of the carbon films were characterized in detail by combining the techniques of Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and transmission electron microscopy (TEM). It is found that carbon films contain Ti 18 at pct; after Ti incorporation, the films consist of titanium carbide; C1s peak appears at 283.4 eV and it could be divided into 283.29 and 284.55 eV, representing sp2 and sp3, respectively, and sp2 is superior to sp3. This Ti-containing film with dominating sp2 bonds is nanocomposites with nanocrystalline TiC clusters embedded in an amorphous carbon matrix, which could be proved by XRD and TEM.

Key words: magnetic sputter deposition, carbon film, carbon bond structure