Influence of Sputtering Gas on Morphological and Optical Properties of Magnesium Films

J. Mater. Sci. Technol. ›› 2011, Vol. 27 ›› Issue (1): 51-58.

• Research Articles • 上一篇下一篇

Influence of Sputtering Gas on Morphological and Optical Properties of Magnesium Films

Yogendra Kumar Gautam,Ramesh Chandra,Amit Kumar Chawla,Vipin Chawla,R D Agarwal

IIT Roorkee

收稿日期:2010-03-23 修回日期:2010-07-23 出版日期:2011-01-28 发布日期:2011-01-30
通讯作者: Amit Kumar Chawla

Influence of Sputtering Gas on Morphological and Optical Properties of Magnesium Films

Yogendra K. Gautam, Amit K. Chawla, Vipin Chawla, R.D. Agrawal, Ramesh Chandra

1) Department of Metallurgical and Materials Engineering, Indian Institute of Technology Roorkee, Roorkee-247667, India
2) Nano Science Laboratory, Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee-247667, India

Received:2010-03-23 Revised:2010-07-23 Online:2011-01-28 Published:2011-01-30
Contact: Amit KumarChawla

摘要/Abstract

摘要： The influence of sputtering gas (He & Ar) on the structural of Mg thin films had been investigated. The optical property (reflectance) that results from the growth of films at varying substrate temperatures (Tsub) were also studied. The deposited films were characterized by using XRD, FE-SEM, AFM and UV-Vis-NIR spectrophotometer. The small crystallite size and lower deposition rate was observed in the presence of Helium atmosphere compared to Argon. Morphology of the films shows 2D hexagonal geometry of grains in the deposition temperature range (Tsub ≈ 50-150oC) in both the sputtering gases. The surface roughness of the polycrystalline films were found to increase with increase in the deposition temperature in both the ambient gases. Optical reflectance of Mg films was measured in near infrared region. Higher reflectance was observed from Mg films sputtered in He atmosphere compared to that in argon.

关键词: Mg films, XRD, Atomic Force Microscope (AFM), Reflectance

Abstract: The influence of sputtering gas (He & Ar) on the structural properties of Mg thin films has been investigated. The optical property (reflectance) that results from the growth of films at varying substrate temperatures (Tsub) was also studied. The deposited films were characterized by using X-ray diffraction (XRD), field emission scaning electron microscopy (FE-SEM), atomic force microscopy (AFM) and UV-Vis-NIR spectrophotometer. The smaller crystallite size and lower deposition rate were observed in the presence of Helium atmosphere compared to Argon. Morphology of the films shows 2D hexagonal geometry of grains in the deposition temperature range (T_sub≈50−150°C) in both the sputtering gases. The surface roughness of the polycrystalline films were found to increase with increase in the deposition temperature of both ambient gases. Optical reflectance of Mg films was measured in near infrared region and larger reflectance was observed from Mg films sputtered in He atmosphere compared to that in argon.

Key words: X-ray diffraction (XRD), Atomic force microscopy (AFM), Reflectance, Mg films, Microstructure

Yogendra Kumar Gautam Ramesh Chandra Amit Kumar Chawla Vipin Chawla R D Agarwal. Influence of Sputtering Gas on Morphological and Optical Properties of Magnesium Films[J]. J. Mater. Sci. Technol., 2011, 27(1): 51-58.

Yogendra K. Gautam Amit K. Chawla Vipin Chawla R.D. Agrawal. Influence of Sputtering Gas on Morphological and Optical Properties of Magnesium Films[J]. J Mater Sci Technol, 2011, 27(1): 51-58.

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Influence of Sputtering Gas on Morphological and Optical Properties of Magnesium Films

Influence of Sputtering Gas on Morphological and Optical Properties of Magnesium Films

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