J. Mater. Sci. Technol. ›› 2010, Vol. 26 ›› Issue (2): 119-124.

• Research Articles • 上一篇    下一篇

闭合场非平衡磁控溅射离子镀制备Ti(C, N)多层膜的组织结构与力学性能

张国君1;李斌1;蒋百灵2;陈迪春1;严富学1   

  1. 1. 西安理工大学
    2. 西安理工大学材料科学与工程学院654#信箱
  • 收稿日期:2009-06-02 修回日期:2009-08-11 出版日期:2010-02-28 发布日期:2010-02-28
  • 通讯作者: 张国君
  • 基金资助:

    国家自然科学基金

Microstructure and Mechanical Properties of Multilayer Ti(C, N) Films by Closed-field Unbalanced Magnetron Sputtering Ion Plating

Guojun Zhang, Bin Li, Bailing Jiang, Dichun Chen, Fuxue Yan   

  1. School of Materials Science and Engineering, Xi'an University of Technology, Xi'an 710048, China
  • Received:2009-06-02 Revised:2009-08-11 Online:2010-02-28 Published:2010-02-28
  • Contact: Guojun Zhang
  • Supported by:

    the National Natural Science Foundation of China (No. 50971097) 
    Shaanxi Provincial Project of Special Foundation of Key Disciplines

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摘要：

本文采用闭合场非平衡磁控溅射技术并选择石墨靶材作为镀层生长中所需的碳源制备了Ti(C, N)多层膜。微观组织研究结果表明所制备的Ti(C, N)镀层具有多层结构并且镀层内含有许多细小的柱状晶粒。石墨靶材电流的变化对Ti(C, N)镀层的多层结构有很大影响，随石墨靶材电流的增加，多层周期厚度增大而镀层内晶粒尺寸逐渐减小，进一步增加靶材电流镀层内甚至出现非晶相。在高石墨靶电流下制备的Ti(C, N)镀层微观组织逐渐由细小的柱状组织转变为纳米颗粒均匀镶嵌在非晶基体的纳米复合组织，在纳米复合镀层中，增加靶材电流镀层内非晶相体积分数增大。测量结果表明，Ti(C, N)多层膜具有高硬度和低摩擦系数，特别当石墨靶材电流为0.9 A下制备的多层膜综合性能最佳。本文还对多层膜微观组织和性能的关系进行了讨论，结果揭示镀层内细小的晶粒尺寸和多层结构是镀层具有好的力学和摩擦性能的主要原因，而选用石墨靶材作为碳源有利于降低镀层的摩擦系数。

关键词: Ti(C, N), 多层膜, 石墨靶材

Abstract:

Ti(C, N) multilayer films have been prepared by closed-field unbalanced magnetron sputtering technology and using graphite target as the C supplier. Microstructural observation results showed that the Ti(C, N) films exhibited multilayer structure with most of fine nano-columnar Ti(C, N) grains existing in the films. The current of graphite target had an effect remarkably on the multilayer structure of films: the periodical thickness gradually increased as the current went up, but the grain size of films gradually decreased and even amorphous phase appeared as the current further increased. The microstructure of Ti(C, N) films changed from columnar crystallite to nanocomposite in high current of graphite target where the fine Ti(C, N) grains were distributed uniformly in the amorphous Ti(C, N) matrix, and the volume fraction of the amorphous phase increased with increasing current. Measurement results showed that the Ti(C, N) multilayer films have high microhardness and low friction coefficient, and especially the film  deposited in the current of 0.9 A exhibits superior properties with optimizing hardness and friction coefficient. Based on the relationship of the microstructure and the properties of films, the multilayer structure and fine grain size of Ti(C, N) films are responsible for their well mechanical and friction properties. And choosing the graphite target as the C supplier is more propitious to decrease the friction coe±cients of films.

Key words: Ti(C, N), Multilayer film, Graphite target