Fig. 1. Evolution of the film growth rate and the target self-bias as a function of the oxygen partial pressure in the sputtering atmosphere.

Fig. 2. Raman spectra for tin oxide films grown at different oxygen partial pressures.

Fig. 3. Optical transmittance data obtained for tin oxide films grown at different oxygen partial pressures.

Fig. 4. Evolution of the average visible transmittance, electrical conductivity and carrier mobility for the as-grown tin oxide layers as a function of the oxygen partial pressure.

Fig. 5. XRD diagrams corresponding to tin oxide films prepared at 12% Opp and subsequently heated in air to different temperatures.

Fig. 6. XRD diagrams corresponding to tin oxide films prepared at 15% Opp and subsequently heated in air to different temperatures.

Fig. 7. XRD diagrams corresponding to tin oxide films prepared at various oxygen ratios and heated in air to 450 °C.

Fig. 8. Raman spectra for tin oxide layers prepared at 12% Opp and heated in air to different temperatures.

Fig. 9. Optical transmittance data obtained for tin oxide films grown at 12% Opp and subsequently heated in air to different temperatures.

Fig. 10. Optical transmittance data obtained for tin oxide films grown at 15% Opp and subsequently heated in air to different temperatures.

Fig. 11. Evolution of the average visible transmittance, electrical conductivity and carrier mobility for tin oxide layers prepared at different oxygen partial pressures and heated in air to 350 °C.