Deposition of Phase-pure Cr2AlC Coating by DC Magnetron Sputtering and Post Annealing Using Cr-Al-C Targets with Controlled Elemental Composition but Different Phase Compositions

doi:10.1016/j.jmst.2017.01.029

Abstract

Abstract:

Polycrystalline Cr₂AlC coatings were prepared on M38G superalloy using a two-step method consisting of magnetron sputtering from Cr-Al-C composite targets at room temperature and subsequent annealing at 620 °C. Particularly, various targets synthesized by hot pressing mixture of Cr, Al, and C powders at 650-1000 °C were used. It was found that regardless of the phase compositions and density of the composite targets, when the molar ratio of Cr:Al:C in the starting materials was 2:1:1, phase-pure crystalline Cr₂AlC coatings were prepared by magnetron sputtering and post crystallization. The Cr₂AlC coatings were dense and crack-free and had a duplex structure. The adhesion strength of the coating deposited on M38G superalloy from the 800 °C hot-pressed target and then annealed at 620 °C for 20 h in Ar exceeded 82 ± 6 MPa, while its hardness was 12 ± 3 GPa.

Key words: Cr₂AlC, Coating, Magnetron sputtering, Composite target, Heat treatment

Yueming Li, Guorui Zhao, Yuhai Qian, Jingjun Xu, Meishuan Li. Deposition of Phase-pure Cr₂AlC Coating by DC Magnetron Sputtering and Post Annealing Using Cr-Al-C Targets with Controlled Elemental Composition but Different Phase Compositions[J]. J. Mater. Sci. Technol., 2018, 34(3): 466-471.

Figures/Tables 13

Table 1 Compositions of M38G superalloy (wt%).

Cr	Co	W	Mo	Al	Ti	Nb	Ni
15.3-16.8	8.0-9.0	23-2.9	1.4-2.0	3.5-4.5	3.2-4.0	0.4-1.0	Bal.

Table 2 Deposition parameters during magnetron sputtering.

Base pressure	Working pressure	Gas flow	Power	Temperature
≤2 × 10^-4 Pa	0.3 Pa	15 SCCM	120 W	R.T.

Fig. 1. XRD patterns of the targets synthesized by hot pressing at (a) 650 °C, (b) 800 °C and (c) 1000 °C.

Table 3 Comparisons of the phase compositions and density of the three hot-pressed targets.

	Preparation condition	Phase composition	Relative density
Target 1	650 °C, 60 min, 10 MPa	C, Cr, Cr₉Al₁₇	59.96%
Target 2	800 °C, 60 min, 10 MPa	C, Cr, Cr₅Al₈, Cr₂Al	67.68%
Target 3	1000 °C, 60 min, 10 MPa	Cr₂AlC, Cr₂Al, C, Cr	89.48%

Fig. 2. Surface morphologies of the targets synthesized at (a) 650 °C, (b) 800 °C, and (c) 1000 °C before sputtering, and (d) 800 °C after sputtering.

Fig. 3. XRD patterns of the coatings deposited from the target hot-pressed at 800 °C, (a) before annealing, (b, c, d) after annealing for 2 h, 10 h and 20 h, respectively.

Fig. 4. XRD patterns of the coatings deposited from the targets synthesized at (a) 650 °C, (b) 800 °C, (c) 1000 °C after annealing at 620 °C for 20 h.

Fig. 5. Surface morphologies of the coatings deposited from the targets synthesized at (a) 650 °C, (b) 800 °C and (c) 1000 °C before annealing.

Fig. 6. Surface morphologies of the coatings deposited from the target hot-pressed at 800 °C after annealing at 620 °C for (a) 2 h, (b) 10 h and (c) 20 h.

Fig. 7. Surface morphologies of the coatings deposited from the targets synthesized at (a) 650 °C and (b) 1000 °C after annealing at 620 °C for 20 h.

Fig. 8. Cross-sectional morphology of the coating deposited from the target hot-pressed at 800 °C after annealing at 620 °C for 20 h.

Fig. 9. (a) TEM cross-sectional image of the coating deposited from the target hot-pressed at 800 °C after annealing at 620 °C for 20 h; (b) SAED of the inner layer; (c) HRTEM image of the outer layer, the inset shows the corresponding FFT results.

Fig. 10. EELS results of the Cr2AlC coating deposited from the target hot-pressed at 800 °C after annealing for 20 h.

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Deposition of Phase-pure Cr₂AlC Coating by DC Magnetron Sputtering and Post Annealing Using Cr-Al-C Targets with Controlled Elemental Composition but Different Phase Compositions

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